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APPLICATION OF MOIST OZONE GAS PHASE FOR REMOVAL OF RESIST AND ORGANIC CONTAMINATION IN A NOVEL TANK TYPE PROCESSOR

Author(s):
Wolke, K.
Riedel, T.
Haug, R.
De Gendt, S.
Heyns, M.M.
Meuris, M.
1 more
Publication title:
Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
99-36
Pub. date:
1999
Page(from):
204
Page(to):
211
Pages:
8
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772594 [1566772591]
Language:
English
Call no.:
E23400/99-36
Type:
Conference Proceedings

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