APPLICATION OF MOIST OZONE GAS PHASE FOR REMOVAL OF RESIST AND ORGANIC CONTAMINATION IN A NOVEL TANK TYPE PROCESSOR
- Author(s):
Wolke, K. Riedel, T. Haug, R. De Gendt, S. Heyns, M.M. Meuris, M. - Publication title:
- Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 99-36
- Pub. Year:
- 1999
- Page(from):
- 204
- Page(to):
- 211
- Pages:
- 8
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566772594 [1566772591]
- Language:
- English
- Call no.:
- E23400/99-36
- Type:
- Conference Proceedings
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