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SILICON CRITICAL CLEANING WITH OZONE, HF AND HCL IN A SPRAY PROCESSOR

Author(s):
Publication title:
Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
99-36
Pub. Year:
1999
Page(from):
30
Page(to):
36
Pages:
7
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772594 [1566772591]
Language:
English
Call no.:
E23400/99-36
Type:
Conference Proceedings

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