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THE EFFECT OF DILUTE CLEANING AND RINSING CHEMISTRIES ON TRANSITION METAL REMOVAL AND Si SURFACE MICROROUGHNESS

Author(s):
Chang, J.P.
Sapjeta, J.
Rosamilia, J.M.
Boone, T.
Eng, J., Jr.
Opila, R.L.
Brennan, S.
Wiemer, C.
Pianetta, P.
4 more
Publication title:
Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
99-36
Pub. Year:
1999
Page(from):
17
Page(to):
24
Pages:
8
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772594 [1566772591]
Language:
English
Call no.:
E23400/99-36
Type:
Conference Proceedings

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