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Effects of Chloride Ion on Copper Deposition into Porous Silicon

Author(s):
Sasano, J.
Jorne, J.
Yoshimi, N.
Tsuboi, T.
Sakka, T.
Ogata, Y.H.
1 more
Publication title:
Fundamental aspects of electrochemical deposition and dissolution : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
99-33
Pub. Year:
1999
Page(from):
84
Page(to):
90
Pages:
7
Pub. info.:
Pennington, New Jersey: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772563 [1566772567]
Language:
English
Call no.:
E23400/99-33
Type:
Conference Proceedings

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