Blank Cover Image

Process Integration Trends for Embedded DRAM

Author(s):
Publication title:
ULSI process integration : proceedings of the first international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
99-18
Pub. Year:
1999
Page(from):
107
Page(to):
122
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772419 [1566772419]
Language:
English
Call no.:
E23400/99-18
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings New Contact Etch Process for Embedded DRAM Applications

Yang, C-L., Chen, T-Y., Huang, K-C., Jung, L-T., Lin, T-A., Lur, W.

MRS - Materials Research Society
7 Conference Proceedings Impact of embedded DRAM logic devices on semiconductor manufacturing

Hirayama,T., Ezaki,T., Ouchi,N.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Process Integration for DRAM Cell Transistor Optimization*

Lee, S., Park, S., Kim, I., Yoon, H.

Electrochemical Society
8 Conference Proceedings Non-Integrability of Hamiltonian Systems Based on Ziglin's Theorem

YOSHIDA, H.

Kluwer Academic Publishers
3 Conference Proceedings Electrodes and Barriers for DRAM and FERAM: Processing, Integration, and Fundamentals

Saenger, K.L., Andricacos, P.C., Athavale, S.D., Baniecki, J.D., Cabral, C., Jr., Costrini, G., Kwietniak, K.T., …

Materials Research Society
9 Conference Proceedings Completely Integrable Systems and Singularity in the Complex t-Plane

YOSHIDA H.

D. Reidel
4 Conference Proceedings Integration of BPSG in a 0.25 mm DRAM Process

Gambino, J.P., Jaso, M.A., Aochi, H., Tsunashima, Y., Peschke, M., Bronne, G.B.

Electrochemical Society
10 Conference Proceedings Requirements for lithography and mask technology from the standpoint of system LSI business(Invited paper)

Kawate,K., Takigawa,T., Ishiuchi,H., Goto,M.

SPIE - The International Society for Optical Engineering
5 Conference Proceedings Integration of BaxSr1-xTiO3 thin film for DRAM application

Kashihara,K., Okudaira,T., Tsunemine,Y., Ohno,Y., Itoh,H., Nishimura,T., Hirayama,M., Horikawa,T., Shibano,T., Horie,K.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Barium Strontium Titanate Capacitors for Embedded DRAM

Zurcher, P., Tracy, C. J., Jones, R. E., Jr., Alluri, P., Chu, P. Y., Jiang, B., Kim, M., Melnick, B. M., Raymond, M. …

MRS - Materials Research Society
6 Conference Proceedings ArF issues of 90-nm-node DRAM device integration

Goo, D.-H., Kim, B.-S., Park, J.-S., Yoon, K.-S., Lee, J.-H., Cho, H.-K., Han, W.-S., Moon, J.-T.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Integration of Rapid Thermal Processing into DRAM Technology

Weimer, R.A.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12