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Poly-Si1-x Ge5 Process Integration for Low Resistance Gate CMOS Technology

Author(s):
Publication title:
Advances in rapid thermal processing : proceedings of the symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
99-10
Pub. Year:
1999
Page(from):
277
Page(to):
284
Pages:
8
Pub. info.:
Pennington, N. J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772327 [156677232X]
Language:
English
Call no.:
E23400/99-10
Type:
Conference Proceedings

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