Thermal Stability Improvement of Cobalt Disilicide Thin Films on (001)Si by High Temperature Sputtering Deposition

Thermal Stability Improvement of Cobalt Disilicide Thin Films on (001)Si by High Temperature Sputtering Deposition

Author(s):

Publication title:

Advances in rapid thermal processing : proceedings of the symposium

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

99-10

Pub. Year:

1999

Page(from):

257

Page(to):

262

Pages:

6

Pub. info.:

Pennington, N. J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566772327 [156677232X]

Language:

English

Call no.:

E23400/99-10

Type:

Conference Proceedings

Details

TDL ID:	ZA00013940
Series ID:	PA00000028
Conf. info. (Name):	International symposium on advances in rapid thermal processing ; Meeting of Electrochemical Society
Conf. info. (Number):	1999 ; 195th
Conf. info. (Venue):	Seattle, WA, USA
Conf. info. (Date):	1999.05.03-1999.05.06

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