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Evaluation of Ultra-Thin Gate Evaluation of Ultra-Thin Gate Stack Dielectrics for 0.1 jim PMOSFETs

Author(s):
Srivastava, A.
Osburn, C.M.
Yee, K.F.
Heinisch, H.H.
Vogel, E.M
Abmed, K.Z.
Wang, Z.
Min, K.
TimberJoke, B.
Parker, C.
Worimnan, J.J.
Hauser, J.R.
7 more
Publication title:
Advances in rapid thermal processing : proceedings of the symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
99-10
Pub. Year:
1999
Page(from):
81
Page(to):
88
Pages:
8
Pub. info.:
Pennington, N. J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772327 [156677232X]
Language:
English
Call no.:
E23400/99-10
Type:
Conference Proceedings

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