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Dopants in Electroplated Copper

Author(s):
Andricacos, P.C.
Parks, C.
Cabral, C.
Wachnik, R.
Tsai, R.
Maihotra, S.
Locke, P.
Fluegel, J.
Horkans, J.
Kwietniak, K.
Uzoh, C.
Rodbell, K.P.
Gignac, L.
Walton, E.
Chung, D.
Geffren, R.
11 more
Publication title:
Electrochemical processing in ULSI fabrication and semiconductor/metal deposition II : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
99-9
Pub. Year:
1999
Page(from):
111
Page(to):
121
Pages:
11
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772310 [1566772311]
Language:
English
Call no.:
E23400/99-9
Type:
Conference Proceedings

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