Blank Cover Image

Variation in the Silicon Oxynitridation Process Along a Furnace Length

Author(s):
Publication title:
Silicon nitride and silicon dioxide thin insulating films, proceedings of the fifth International Symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
99-6
Pub. Year:
1999
Page(from):
143
Page(to):
154
Pages:
12
Pub. info.:
Pennington, New Jersey: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772280 [1566772281]
Language:
English
Call no.:
E23400/99-6
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Furnace Silicon Oxynitridation in Nitrous Oxide Ambients

Singhvi, S., Takoudis, C.G.

Electrochemical Society
7 Conference Proceedings In-Situ Infrared Emission Spectroscopy During Silicon Chemical Vapor Deposition

Takoudis. C.G., Panezyk, C.

Electrochemical Society
2 Conference Proceedings On the Silicon Suboxide Layer Above an Atomically Abrupt Silicon Oxide/Si(100) Interface in N2O Furnace Oxidation

Dang, S.S., Duscher, G., Browning, N.D., Pennycook, S., Takoudis, C.G.

Electrochemical Society
8 Conference Proceedings In Situ FTIR Emission Spectroscopy in Silicon Chemical Vapor Deposition on H-Terminated Si(111) and Si(100) Surfaces

Panczyk, C., Takoudis, C.G.

American Institute of Chemical Engineers
3 Conference Proceedings Effect of Process Conditions on Gas-Phase Decomposition of Nitrous Oxide in Furnace Oxynitridation of Silicon

Singhvi, Shri, Dang, Sanjit Singh, Rupangudi, Ramana V., Takoudis, Christos G.

American Institute of Chemical Engineers
9 Conference Proceedings Emission Infared Spectroscopy as an in-Situ Probe of CVD at High Gas Pressures: The Epitaxial Silicon CVD

Christopher, P., Takoudis, C.G.

Electrochemical Society
4 Conference Proceedings Growth of Silicon Suboxide Layer Above An Atomically Abrupt SiO2/Si(100) Interface in Conventional Furnace Oxynitridation Using N2O Ambients

Pennycook, Stephen J., Browning, Nigel D., Dang, SANJIT S., Duscher, GERD, Rupangudi, Ramana V., Takoudis, Christos G., …

American Institute of Chemical Engineers
10 Conference Proceedings Relationships Between Process Fundamentals, Facility Design and Production Control of Semiconductor Manufacturing Systems

Hase, R.C., Burgos, M.C., Chen, S., Uzsoy, R., Takoudis, C.G.

American Institute of Chemical Engineers
5 Conference Proceedings Nitrogen Incorporation Near Top and Bottom Surfaces of Ultra- Thin Silicon Oxynitrides

Dang, S.S., Takoudis, C.

Electrochemical Society
11 Conference Proceedings Relationships between process fundamentals,facility design,and production control of semiconductor manufacturing systems

Chen,S., Hase,R.C., Mordaunt,K., Uzsoy,R.M., Takoudis,C.G.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Process improvements for reductions in total charge and interface trap densities of thermally-grown sub-3.5nm-thick silicon nitrides

Dang, Sanjit Singh, Takoudis, Christos G.

MRS-Materials Research Society
12 Conference Proceedings Design and simulation of a vacuum micropump

Cui,Z., Takoudis,C.G.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12