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High-Density Plasma Etching of Group-III Nitride Films for Device Application

Author(s):
Shul, R.
Zhang, L
Baca, A.
Han, J.
Crawford, M.
Willison, C.
Pearton, S.
Ren, F.
Zolper, J.
Lester, L.
5 more
Publication title:
Proceedings of the State-of-the-Art Program on Compound Semiconductors (SOTAPOCs XXX)
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
99-4
Pub. date:
1999
Page(from):
25
Page(to):
39
Pages:
15
Pub. info.:
Pennington, N. J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772266 [1566772265]
Language:
English
Call no.:
E23400/99-4
Type:
Conference Proceedings

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