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Inductively-Coupled Plasma Deposition of Low Temperature Silicon Dioxide and Silicon Nitride Films for III-V Applications

Author(s):
Publication title:
Proceedings of the State-of-the-Art Program on Compound Semiconductors (SOTAPOCs XXX)
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
99-4
Pub. Year:
1999
Page(from):
1
Page(to):
12
Pages:
12
Pub. info.:
Pennington, N. J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772266 [1566772265]
Language:
English
Call no.:
E23400/99-4
Type:
Conference Proceedings

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