STUDY OF CHEMICAL MECHANICAL POLISHING ON STI(SHALLOW TRENCH ISOLATION)TO OBTAIN LOW DEFECT

STUDY OF CHEMICAL MECHANICAL POLISHING ON STI(SHALLOW TRENCH ISOLATION)TO OBTAIN LOW DEFECT

Author(s):

Publication title:

Proceedings of the Fifth International Symposium of Process Physics and Modeling in Semiconductor Technology

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

99-2

Pub. Year:

1999

Page(from):

215

Page(to):

219

Pages:

5

Pub. info.:

Pennington, New Jersey: Electrochemical Society

ISSN:

01616374

ISBN:

9781566772242 [1566772249]

Language:

English

Call no.:

E23400/99-2

Type:

Conference Proceedings

Details

TDL ID:	ZA00013932
Series ID:	PA00000028
Conf. info. (Name):	International Symposium on Process Physics and Modeling in Semiconductor Technology ; Spring Meeting of the Electrochemical Society
Conf. info. (Number):	5th ; 195th
Conf. info. (Venue):	Seattle, Washington, USA
Conf. info. (Date):	1999.05.05-1999.05.06

Similar Items:

1 Conference Proceedings Colloidal Silica based High Selectivity Shallow Trench Isolation (STI) Chemical Mechanical Polishing (CMP) Slurry Bu, Kyoung-Ho, Moudgil, Brij M. Materials Research Society	7 Conference Proceedings Improved Shallow Trench Isolation Process for Sub-Quarter-Micron CMOS Technologies Sallagoity, P., Gaillard, F., Rivoire, M., Paoli, M., Brouquet, P., Haond, M., McClathie, S., Beekmann, K., Kiermasz, … Electrochemical Society
2 Conference Proceedings Defect detection strategies for chemical-mechanical polishing process in shallow-trench isolation applications Li,J.J., Liu,A.H., Hiemke,S.S. SPIE - The International Society for Optical Engineering	8 Conference Proceedings In-situ Metrology for End Point Detection during Chemical Mechanical Polishing of Shallow Trench Isolation Structures Zantye, Parshuram B., Mudhivarthi, S., Kumar, Ashok, Evans, David Materials Research Society
3 Conference Proceedings Scatterometry for shallow trench isolation (STI) process metrology Raymond,C.J., Littau,M.E., Markle,R.J., Purdy,M.A. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Chemical Mechanical Planarization (CMP) Process Windows in Shallow Trench Isolation for Advanced CMOS Chaterjee, A., Kwok, S.P., Ali, I., Joyner, K., Shinn, G., Sheng, I.-C. Electrochemical Society
4 Conference Proceedings The Integration of Shallow Trench Isolation (STI) for High Density DRAM with 0.18 μm Technology and Beyond Pan, P., McQueen, M., Robinson, K., Sharan, S., Batra, S., Lane, R., Somerville, L., Tran, L.C. Electrochemical Society	10 Conference Proceedings Defect Generation and Suppression in Device Processes Using a Shallow Trench Isolation Scheme Peschiarolli, D., Brambilla, M., Carnevale, G.P., Cascella, A., Cazzaniga, F, Clementi, c., Cremonesi, C., Gilardini, … Electrochemical Society
5 Conference Proceedings Chemical-Mechanical Polishing for Shallow Trench Isolation: A New Interpretation Sun, Hongliang, Olewine, Michael, Wall, Ralph Electrochemical Society	11 Conference Proceedings Investigation of Hump Degradation by F-N stress for Narrow Width n-MOSFETs with Shallow Trench Isolation (STI) J. Seo, J. Seok, H. Kim, S. Lee, J. Jeon Electrochemical Society
6 Conference Proceedings Optimization of scatterometry parameters for shallow trench isolation (STI) monitor Leray, P.J., Cheng, S., Kremer, S., Ercken, M., Pollentier, I. SPIE - The International Society of Optical Engineering	12 Conference Proceedings Study of integration issues in shallow trench isolation for deep submicron CMOS technologies Chatterjee,A., Mason,M.E., Joyner,K., Rogers,D., Mercer,D., Kuehne,J., Esquivel,A.L., Mei,P., Murtaza,S.S., Taylor,K.J., … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12