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Characterization of the Oxide CMP Process for Shallow Trench Isolation Based Advanced BiCMOS Technologies

Author(s):
Damiano, J.
Tian, H.
Perera, A.
Subramanian, C.
Hayden, J.
Haygood, B.
1 more
Publication title:
Proceedings of the Second International Symposium on Chemical Mechanical Planariarization [sic] in Integrated Circuit Device Manufacturing
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
98-7
Pub. Year:
1998
Page(from):
52
Page(to):
58
Pub. info.:
Pennington, N. J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772013 [156677201X]
Language:
English
Call no.:
E23400/98-7
Type:
Conference Proceedings

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