Blank Cover Image

CMP Applications for Sub-0.25μm Process Technologies

Author(s):
Publication title:
Proceedings of the Second International Symposium on Chemical Mechanical Planariarization [sic] in Integrated Circuit Device Manufacturing
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
98-7
Pub. date:
1998
Page(from):
1
Page(to):
8
Pub. info.:
Pennington, N. J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772013 [156677201X]
Language:
English
Call no.:
E23400/98-7
Type:
Conference Proceedings

Similar Items:

Weling, M., Lin, X.-W.

Electrochemical Society

Lin, X. W., Weling, M.

MRS - Materials Research Society

Pramanik, D., Weling, M.

Electrochemical Society

Blumenthal, R., Braekelmann, G., Cave, N. G., Conner, J., Crabtree, P., Defilippi, J., Denning, D., Farkas, J., …

Materials Research Society

Weling, M., Bothra, S., Qian, L., Sethi, S., Pramanik, D.

Electrochemical Society

Jung,S.-J., Kim,H.-S., Kim,D.-G., Choi,Y.-W.

SPIE-The International Society for Optical Engineering

Weling, Milind, Dunton, Vance, Zhang, Liming, Annapragada, Rao

Electrochemical Society

Sun, J., Srivastava, A., Bartholomew, R.F., Bellur, K., Osburn, C.M., Masnari, N.A.

Electrochemical Society

Stephens, J., Dobuzinsky, D., Gambina, J., Glashauser, W., Huckels, K., Hanebeck, J., Kraxenberger, M., Naeem, M., Rupp, …

Electrochemical Society

Tsai, T.C., flu, S.C., Lin, Z.H., Hsu, S.H., Hsu, C.L., Dai, J., Yang, F., Lin, M.H., Chen, H.C., Hsieh, W.Y.

Electrochemical Society

Haider, A.M., Rose, D.J., Dehord, J.R.D., Zuhoski, S.P.

Electrochemical Society

White,T.R., Kolar,D., Jahanbani,M., Frisa,L.E., Nagabushnam,R., Chuang,H., Tsui,P., Cope,J., Pulvirent,L., Bolton,S.

SPIE-The International Society for Optical Engineering

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12