Blank Cover Image

Radical Transport in an Inductively-Coupled-Plasma Ashing Reactor for a 300 mm Wafer

Author(s):
Publication title:
Proceedings of the twelfth International Symposium on Plasma Processing
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
98-4
Pub. Year:
1998
Page(from):
254
Page(to):
265
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771986 [1566771986]
Language:
English
Call no.:
E23400/98-4
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Plasma ashing using microwaves via slot antenna for 300-mm wafers

Furuya,M., Kano,M., Terai,F., Aoki,K., Yamauchi,T., Yamada,K., Tamai,K., Azumano,H.

SPIE - The International Society for Optical Engineering
7 Conference Proceedings In-line Automatic Defect Inspection and Repair Method for a High Yield TFT Array Production

H. Honoki, N. Nakasu, T. Arai, K. Yoshimura, T. Edamura

Electrochemical Society
2 Conference Proceedings Inductively-Coupled Plasma Etching of NiFe and NiFeCo

Jung, K. B., Childress, J. R., Pearton, S. J., Jenson, M., Hurst, A. T., Jr., Johnson, D.

MRS - Materials Research Society
8 Conference Proceedings INDUCTIVELY-COUPLED PLASMA NITRIDING OF FUSED SILICA

Vethanayagam, T.K., Johnson, P.F.

Materials Research Society
3 Conference Proceedings Defining conditions for the etching of silicon in an inductive coupled plasma reactor

Ashraf, H., Bhardwaj, J. K., Guibarra, E., Hall, S., Hopkins, J., Hynes, A. M., Johnston, I., Lea, L., McCauley, S., …

MRS-Materials Research Society
9 Conference Proceedings Spherical Phosphors Prepared by Inductively Coupled Thermal Plasma

Tamatani, M., Matsuda, N., Okumura, M., Albessard, A.K., Inoue, Y., Yokota, S., Kawasaki, K.

Electrochemical Society
4 Conference Proceedings Inductively coupled plasma etching of ZnO

K. J. Nordheden, M. Dineen, C. Welch

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Modeling of Pulsed-Power Inductively Coupled Plasma Reactors

Bukowski, J.D., Stewart, R.A., Graves, D.B., Vitello, P.

Electrochemical Society
5 Conference Proceedings ICP (inductively coupled plasma) dry etch of DUV MoSi HTPSM

Lee, K. Y., Kim, L. J., Nam, K. -H., Park, K. T., Ku, Y. M., Ku, S. S., Hur, I. B.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Plasma reactor etch modeling using inductively coupled plasma spectroscopy diagnostic techniques

Mautz,K.E.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Inductively Coupled Plasma Test Reactor Development and Plasma Measurements

Monteiro, M. J. R., Kostryukov, A., Daltrini, A. M., Moshkalyov, S. A., Machida, M., Besseler, E.

Electrochemical Society
12 Conference Proceedings Transport and Reaction in Inductively Coupled Plasmas for Microelectronics

Economou J. D., Feldsien J., Wise S. R.

Lenum Press
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12