Blank Cover Image

Shallow Trench Etch with a Planar Inductively Coupled Plasma Discharge

Author(s):
Publication title:
Proceedings of the twelfth International Symposium on Plasma Processing
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
98-4
Pub. Year:
1998
Page(from):
222
Page(to):
230
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771986 [1566771986]
Language:
English
Call no.:
E23400/98-4
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Etch Induced Damage in High Density Inductively Coupled Plasma Etching Reactor

Zhong, W., Misra, D., Bartynski, R.A., Patel, V., Singh, B.

Electrochemical Society
7 Conference Proceedings Inductively-Coupled Plasma Etching of NiFe and NiFeCo

Jung, K. B., Childress, J. R., Pearton, S. J., Jenson, M., Hurst, A. T., Jr., Johnson, D.

MRS - Materials Research Society
2 Conference Proceedings ICP (inductively coupled plasma) dry etch of DUV MoSi HTPSM

Lee, K. Y., Kim, L. J., Nam, K. -H., Park, K. T., Ku, Y. M., Ku, S. S., Hur, I. B.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Improvement of III-N Surfaces after Inductively Coupled Plasma Dry Etch Exposure

Keogh, D.M., Dupuis, R.D., Feng, M., Raychaudhuri, S., Asbeck, P.M.

Electrochemical Society
3 Conference Proceedings DIAMOND DEPOSITION USING A PLANAR RADIO FREQUENCY INDUCTIVELY COUPLED PLASMA

Bozeman, S.P., Tucker, D.A., Stoner, B.R., Glass, J.T., Hook, W.M.

Electrochemical Society
9 Conference Proceedings Etch Characteristics of GaN Using Inductively-Coupled Cl2/HBr and Cl2/Ar Plasmas

Kim, H. S., Lee, Y. J., Lee, Y. H., Lee, J. W., Yoo, M. C., Kim, T. I., Yeom, G. Y.

MRS - Materials Research Society
4 Conference Proceedings Plasma Etch Processing for Shallow Trench Isolation Microcontour Control

Werbaneth, P., Almerico, J., Jerde, L., Rousey-Seidel, M.

Electrochemical Society
10 Conference Proceedings Inductively coupled plasma etching of ZnO

K. J. Nordheden, M. Dineen, C. Welch

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Low-threshold InGaAsP laser with etched facets by inductively coupled plasma

Wang, J., Xiong, B., Sun, C.-Z., Hao, Z.B., Luo, Y.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Phase gratings made with inductively coupled plasma technology

Zhou,C., Xi,P., Dai,E., Liu,L., Ru,H.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Silicon Microfabrication: Laser Ablation vs. Inductively Coupled Plasma (ICP) Etch

Owens, Megan M., Soucy, Joseph W., Marinis, Thomas F.

Materials Research Society
12 Conference Proceedings Computer Simulation of Inductively Coupled Plasmas Using Chlorine Feed Gas

Ho, M-H., Thompson, B.E.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12