Blank Cover Image

Thin Nitride Barrier Self-Aligned Contact (TNBSAC) Oxide Etching in a High Density Inductively Coupled Plasma Using C4F8/CH3F/Ar Chemistry

Author(s):
Kim, J-H.
Ryu, J-O.
Kim, J-S.
Lee, B-C.
Kim, J-W.
Seol, Y-S.
1 more
Publication title:
Proceedings of the twelfth International Symposium on Plasma Processing
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
98-4
Pub. date:
1998
Page(from):
137
Page(to):
145
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771986 [1566771986]
Language:
English
Call no.:
E23400/98-4
Type:
Conference Proceedings

Similar Items:

Kim,J.-H, Ryu,J.-O., Kim,J.-S., Kim,J.-W., Seol,Y.-S

SPIE-The International Society for Optical Engineering

Constantine, C., Johnson, D., Barratt, C., Shul, R. J., McClellan, G. B., Briggs, R. D., Rieger, D. J., Karlicek, R. F., …

MRS - Materials Research Society

Choi, C-J., Kwon, O-S., Seol, Y-S.

Electrochemical Society

Li, N., Waki, I., Kumtornkittikul, C., Liang, J.-H., Sugiyama, M., Shimogaki, Y., Nakano, Y.

Electrochemical Society

W. Lim, L. Stafford, B. Gila, D. Norton, S. Pearton, F. Ren, J. Song, J. Park, Y. Heo, J. Lee, J. Kim

Electrochemical Society

Park, W.J., Hong, J., Jeon, J.S., Min, G.J., Chi, K.K., Moon, J.T.

Electrochemical Society

Park, C., Cho, J. H., Choi, C. J., Seol, Y. S., Choi, I. H.

MRS - Materials Research Society

10 Conference Proceedings Inductively coupled plasma etching of ZnO

K. J. Nordheden, M. Dineen, C. Welch

SPIE - The International Society of Optical Engineering

Vartuli, C.B., Pearton, S.J., Abernathy, C.R., Shul, R.J., Ren, F.

Electrochemical Society

Kim, Dong-Pyo, Kim, Chang-Il

Electrochemical Society

Efremov, A., Svettsov, V., Kim, C.-I.

SPIE - The International Society of Optical Engineering

Cho, H., Hahn, Y. B., Hays, D. C., Jung, K. B., Donovan, S. M., Abernathy, C. R., Pearton, S. J., Shul, R. J.

MRS - Materials Research Society

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12