Selected Topics in Plasma Processing Research | 東京工業大学附属図書館文献データベース

Blank Cover Image

Selected Topics in Plasma Processing Research

Author(s):

Publication title:

Proceedings of the twelfth International Symposium on Plasma Processing

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

98-4

Pub. Year:

1998

Page(from):

1

Page(to):

12

Pub. info.:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566771986 [1566771986]

Language:

English

Call no.:

E23400/98-4

Type:

Conference Proceedings

Details

TDL ID:	ZA00013907
Series ID:	PA00000028
Conf. info. (Name):	International Symposium on Plasma Processing ; Meeting of the Electrochemical Scoety
Conf. info. (Number):	12th ; 193rd
Conf. info. (Venue):	San Diego, CA, USA
Conf. info. (Date):	1998.05.03-1998.05.08

Similar Items:

1 Conference Proceedings High Density Plasma Gate Etching of 0.12 um Devices with Sub-1.5 nm Gate Oxides Klemens, F.P., Baumann, F.H., Kornblit, A., Layadi, N., Lee, H., Maynard, H.L., Mytych, J.M., Sorch, T.W., Tennant, … Electrochemical Society	7 Conference Proceedings SELECTED TOPICS IN UPSILON PHYSICS Lee-Franzini J. Plenum Press
2 Conference Proceedings Depth of focus enhancement for 193-nm window lithography with subresolution assist features Watson,G.P., Kroyan,A., Cirelli,R.A., G,P Klemens, Timp,L., Nalamasu,O., Maynard,Lucent H.L., Sweeney,J.R., … SPIE - The International Society for Optical Engineering	8 Conference Proceedings Hyperthermal Nitridation for Ultrathin Silicon Oxynitride Gate Dielectrics Krug, C., Baumvol, I.J.R., Stedile, F.C., Green, M.L., Klemens, F., Silverman, P.J., Sorsch, T.W., Alvarez, F., Hammer, … Electrochemical Society
3 Conference Proceedings The Vertical Replacement-Gate (VRG) MOSFET: A High-Performance, Vertical MOSFET with Lithography-Independent Critical Dimensions Hergenrother, J.M., Oh, S.H., Nigam, T., Monroe, D., Klemens, F.P., Kornblit, A., Baumann, F.H., Grazul, J.L., Johnson, … Electrochemical Society	9 Conference Proceedings *Gate technology issues for silicon MOS nanotransistors Tennant, D. M., Timp, G. L., Ocola, L. E., Green, M., Sorsch, T., Kornblit, A., Klemens, F., Kleiman, R., Muller, D. A., … MRS-Materials Research Society
4 Conference Proceedings MEMS mirror array for a wavelength-selective 1xK switch (Invited Paper) Lopez, D.O., Pardo, F., Aksyuk, V.A., Simon, M.E., Shea, H.R., Marom, D.M., Neilson, D.T., Cirelli, R.A., Klemens, F.P., … SPIE-The International Society for Optical Engineering	10 Conference Proceedings Evolution of an advanced topics course Donnelly, J. F., Seebeck, R. G. SPIE - The International Society of Optical Engineering
5 Conference Proceedings Cl2 Plasma-Si Surface Interactins in Plasma Etching Donnelly M. V., Layadi N., Lee C. T. J., Herman P. I., Guinn V. K., Cheng C. C. kluwer Academic Publishers	11 Conference Proceedings Nanoscale Electronic Devices The Nano-Transistor Timp, G., Baumann, F., Bude, J., Bourdelle, K.K., Green, M., Grazul, J., Chetti, A., Forsyth, G., Kleiman, R., Kiemens, … Electrochemical Society
6 Conference Proceedings Toward the ultimate storage device: the fabrication of an ultrahigh-density memory device with 193-nm lithography Cirelli, R. A., Bude, J., Mansfield, W. M., Timp, G. L., Klemens, F. P., Watson, C. P., Weber, G. R., Sweeney, J R., … SPIE - The International Society of Optical Engineering	12 Conference Proceedings INVITED: 50 nm VERTICAL REPLACEMENT-GATE (VRG) nMOSFETS WITH ALD HfO2 GATE DIELECTRICS Hergenrother, J.M., Nigani, T., Wilk, O.D., Klemens, F.P., Monroe, D., Sorsch, T.W., Busch, B., Green, M.L., Muller, … Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12