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Compatibility of Low Dielectric Constant Poly (arylether) with the Electroless Copper Deposition Solution

Author(s):
Hsu, D.
Iskander, M.
Tong, H.Y.
Shi, F.
Lopatin, S.
Shacham-Diamand, Y.
Zhao, B.
Brongo, M.
Vasudev, P.K.
4 more
Publication title:
Dielectric material integration for microelectronics
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
98-3
Pub. Year:
1998
Page(from):
103
Page(to):
112
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771979 [1566771978]
Language:
English
Call no.:
E23400/98-3
Type:
Conference Proceedings

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