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OXYGEN CLUSTERING IN CZOCHRALSKI SILICON AT LOW TEMPERATURES: ENHANCED DIFFUSION OR SPATIAL CORRELATION?

Author(s):
McQuaid, S.A.
Johnson, B.K.
Gambaro, D.
Falster, R.
Ashwin, M.
Newman, R.C.
1 more
Publication title:
Silicon materials science and technology : proceedings of the Eighth International Symposium on Silicon Materials Science and Technology
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
98-1(2)
Pub. Year:
1998
Page(from):
1023
Page(to):
1032
Pages:
10
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771931 [1566771935]
Language:
English
Call no.:
E23400/98-1
Type:
Conference Proceedings

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