INVITED: WAFER CLEANING: A QUANTIFIABLE PROCESS STEP
- Author(s):
Mertens, P.W. Loewenstein, L. Vos, R. De Gendt, S. Bearda, T. Heynes, M.M. - Publication title:
- Silicon materials science and technology : proceedings of the Eighth International Symposium on Silicon Materials Science and Technology
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 98-1(1)
- Pub. Year:
- 1998
- Page(from):
- 592
- Page(to):
- 606
- Pages:
- 15
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566771931 [1566771935]
- Language:
- English
- Call no.:
- E23400/98-1
- Type:
- Conference Proceedings
Similar Items:
Electrochemical Society |
Electrochemical Society |
2
Conference Proceedings
VAPOR PHASE DECOMPOSITION - DROPLET COLLECTION EVALUATION OF A WAFER SURFACE PREPARATION SYSTEM
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
9
Conference Proceedings
MODELLING OF CRYSTAL ORIGINATED PARTICLES AND THEIR IMPACT ON GATE OXIDE INTEGRITY
Electrochemical Society |
Electrochemical Society |
10
Conference Proceedings
MODELLING OF CRYSTAL ORIGINATED PARTICLES AND THEIR IMPACT ON GATE OXIDE INTEGRITY
Electrochemical Society |
5
Conference Proceedings
INTRODUCTORY REMARKS -WAFER PREPARATION: ULTRA-CLEAN PROCESSING AND Si- MATERIAL DEFECTS
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |