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THE FORMATION AND REMOVAL OF RESIDUE FORMED DURING TiN FLUOROCARBON PLASMA ETCHING

Author(s):
Kim, Y.B.
Conard, T.
Vanhaeren, D.
Baklanov, M.
Vanhaelemeersch, S.
Vandervorst, W.
Maex, K.
2 more
Publication title:
Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
97-35
Pub. Year:
1997
Page(from):
610
Page(to):
616
Pages:
7
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771887 [1566771889]
Language:
English
Call no.:
E23400/97-35
Type:
Conference Proceedings

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