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ROOM TEMPERATURE PHOTORESIST REMOVAL PROCESS BY USING KF/H2O2/H2O

Author(s):
Publication title:
Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
97-35
Pub. Year:
1997
Page(from):
488
Page(to):
495
Pages:
8
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771887 [1566771889]
Language:
English
Call no.:
E23400/97-35
Type:
Conference Proceedings

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