NATURAL HYDROCARBON DEPOSITION ON SILICON WAFERS AND REMOVAL AS MEASURED BY IMS
- Author(s):
- Publication title:
- Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 97-35
- Pub. Year:
- 1997
- Page(from):
- 447
- Page(to):
- 454
- Pages:
- 8
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566771887 [1566771889]
- Language:
- English
- Call no.:
- E23400/97-35
- Type:
- Conference Proceedings
Similar Items:
Electrochemical Society |
7
Conference Proceedings
Laser-induced shock wave removal of chemical-mechanical polishing slurries from silicon wafers
SPIE-The International Society for Optical Engineering |
Electrochemical Society |
8
Conference Proceedings
Testing and Characterization of ISS Pressurized Modules Versus On-Orbit Vibro-Acoustic Environment - Lessons Learned
ESA Communication Production Office |
Electrochemical Society |
9
Conference Proceedings
Structural and Optical Characterization of Polycrystalline Silicon Films Deposited by Single Wafer CVD
Electrochemical Society |
SPIE - The International Society of Optical Engineering |
Electrochemical Society |
Electrochemical Society |
11
Conference Proceedings
Effect of Trace Oxygen on Selective Silicon Deposition in a Single-Wafer RTP CVD Reactor
Electrochemical Society |
SPIE - The International Society for Optical Engineering |
12
Conference Proceedings
Soft-Stowed Approach: Safe Transportation to ISS for Experiments, Spares & New Hardware
ESA Communications, ESTEC |