Blank Cover Image

Device Quality Room Temperature Deposited Silicon Nitride Films

Author(s):
Publication title:
Proceedings of the International Symposium on Thin Film Materials, Processes, Reliability, and Applications, Thin Film Processes
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
97-30
Pub. Year:
1997
Page(from):
253
Page(to):
264
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771832 [1566771838]
Language:
English
Call no.:
E23400/97-30
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Low Temperature Polycrystalline Silicon Thin Films Deposited by ECR Plasma

Kalkan, A.K., Bae, S., Farber, D.G., Fonash, S.J.

Electrochemical Society
7 Conference Proceedings Development of low temperature silicon nitride and silicon dioxide films by inductively-coupled plasma chemical vapor deposition

Lee, J.W., Mackenzie, K.D., Johnson, D., Pearton, S.J., Ren, F., Sasserath, J.N.

Materials Research Society
2 Conference Proceedings Low-Temperature, High-Quality Silicon Dioxide Thin Films Deposited Using Tetramethylsilane (TMS)

Reber, D. M., Fonash, S. J.

MRS - Materials Research Society
8 Conference Proceedings Optical Characterization of Hydrogenated Silicon Films in the Extended Energy Range

Globus, T., Fonash, S. J., Gildenblat, G.

MRS - Materials Research Society
3 Conference Proceedings Nanostructured silicon for biomedical application

Fonash,S.J., Cuiffi,J., Hayes,D., Nam,W.J., Bae,S., Li,H., Kalkan,A.K.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings ELECTRONIC DEVICE FABRICATION USING ELECTRON CYCLOTRON RESONANCE ETCHING OF BORON DOPED HOMOEPITAXIAL DIAMOND FILMS

Grot, S.A., Ditizio, R.A., Gildenblat, G.Sh., Badzian, A.R., Fonash, S.J.

Materials Research Society
4 Conference Proceedings Low Temperature Silicon Dioxide Thin Films Deposited Using Tetramethylsilane for Stress Control and Coverage Applications

Lin, Xin, Fonash, Stephen J.

Materials Research Society
10 Conference Proceedings High Electron Mobility TFTs of Nanocrystalline Silicon Deposited at 150°C on Plastic Foil

Cheng, I-Chun, Wagner, Sigurd, Bae, Sanghoon, Fonash, Stephen J.

Materials Research Society
5 Conference Proceedings Integration of thin film electronics and MEMS

Fonash,S.J.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Growth Front Roughening of Room Temperature Deposited Oligomer Thin Films

Tsamouras, D., Palasantzas, G., Hosson, J.Th.M. De, Hadziioannou, G.

Materials Research Society
6 Conference Proceedings Silicon micromachining and its impact on materials and device properties: plasma etching damage issues

O.O. Awadelkarim, T. Gu, S.J. Fonash

Society of Photo-optical Instrumentation Engineers
12 Conference Proceedings QUASI-STOICHIOMETRIC SILICON NITRIDE THIN FILMS DEPOSITED BY REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION

Lucovsky, G., Ma, Y., He, S.S., Yasuda, T., Stephens, D.J., Habermehl, S.

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12