Blank Cover Image

Low Temperature Thin Oxide Film Formation by Microwave Excitation High Density Plasma Direct Oxidation

Author(s):
Publication title:
Proceedings of the International Symposium on Thin Film Materials, Processes, Reliability, and Applications, Thin Film Processes
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
97-30
Pub. date:
1997
Page(from):
223
Page(to):
230
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771832 [1566771838]
Language:
English
Call no.:
E23400/97-30
Type:
Conference Proceedings

Similar Items:

Saito, Y., Sekine, K., Hirayama, M., Ohmi, T.

Electrochemical Society

Futamoto, M., Inaba, N., Hirayama, Y., Itoh, K., Honda, Y.

Electrochemical Society

Ohmi, T., Sekine, K., Kaihara, R., Saito, Y., Shirai, Y., Hirayama, M.

MRS - Materials Research Society

Azuma, K., Goto, M., Okamoto, T., Nakata, Y.

Electrochemical Society

Ohmi, T., Sugawa, S., Hirayama, M.

Electrochemical Society

M. Morita, K. Nakamura, A. Teramoto, K. Makihara, T. Ohmi

Electrochemical Society

Ohmi, Tadahiro, Sugawa, Shigetoshi, Hirayama, Masaki

Electrochemical Society

Takano, J., Makihara, K., Ohmi, T.

MRS - Materials Research Society

Kawai, Y., Konishi, N., Watanabe, J., Ohmi, T.

Electrochemical Society

Yamanaka, Go, Uchikawa, Takafumi, Ohmi, Shun-ichiro, Sakai, Tetsushi

Materials Research Society

Ohmi, T., Okada, Y., Yabune, T., Ohmi, K.

Electrochemical Society

Hendrix,Bryan C., Stauf,Gregory T.

IMAPS, SPIE-The International Society for Optical

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12