Surface Damage Characterization in a Magnetically Enhanced Reactive Ion Etcher

Surface Damage Characterization in a Magnetically Enhanced Reactive Ion Etcher

Author(s):

Publication title:

Proceedings of the International Symposium on Thin Film Materials, Processes, Reliability, and Applications, Thin Film Processes

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

97-30

Pub. Year:

1997

Page(from):

167

Page(to):

174

Pub. info.:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566771832 [1566771838]

Language:

English

Call no.:

E23400/97-30

Type:

Conference Proceedings

Details

TDL ID:	ZA00013892
Series ID:	PA00000028
Conf. info. (Name):	International Symposium on Thin Film Materials, Processes, Reliability, and Applications, Thin Film Processes ; Joint International Meeting of the Electrochemical Society
Conf. info. (Number):	1997 ; 1997
Conf. info. (Venue):	Paris, France
Conf. info. (Date):	1997.08.31-1997.09.05

Similar Items:

1 Conference Proceedings SURFACE AND INTERFACE DAMAGE CHARACTERIZATION OF REACTIVE ION ETCHED MBE REGROWN GaAs Cole, M.W., Dutta, M., Rossabi, J., Smith, D.D., Lehman, J.L. Materials Research Society	7 Conference Proceedings Reducing RIE Lag with Chemistry Buie, M.J., Joshi, A.M., Regis, J. Electrochemical Society
2 Conference Proceedings TEMPERATURE DEPENDENCE OF ETCH RATE AND RESIDUAL DAMAGE IN REACTIVELY ION ETCHED GaAs AND A1GaAs Pearton, S.J., Jones, K.S., Chakabarti, U.K., Emerson, B., Lane, E., Vasile, M.J., Fullowan, T.R., Hobson, W.S., Short, … Materials Research Society	8 Conference Proceedings Chrome etch for <0.13μm advanced reticle production Buie,M.J., Stoehr,B., Huang,Y.-C. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Electrical Characterization of Damage Phenomena Induced in Silicon by Magnetically-Enhanced Reactive Ion Etching Awadelkarim, O.O., Gu, T., Mikulan, P.I., Fonash, S.J., Reinhardt, K., Chan, Y.D. Electrochemical Society	9 Conference Proceedings Examination of various endpoint methods for chrome mask etch Collard, C., Anderson, S.A., Anderson, R.B., III, Clevenger, J.O., Halim, M., Brooks, C.B., Buie, M.J., Sahin, T. SPIE - The International Society of Optical Engineering
4 Conference Proceedings ASSESSMENT OF SURFACE DAMAGE OF GALLIUM ARSENIDE DUE TO REACTIVE ION ETCHING Puttock, M. S., Thomas, H., Morgan, D. V., Rossow, U., Zahn, D. R. T., Richter, W., Hilton, K. P., Woodward, J. Materials Research Society	10 Conference Proceedings PHOTOREFLECTANCE CHARACTERISATION OF REACTIVE ION ETCHED SILICON Murtagh, M., Beechinor, J. T., Herbert, P. A. F., Kelly, P. V., Crean, G. M., Jeynes, C. MRS - Materials Research Society
5 Conference Proceedings Characterization of an integrated multibeam laser mask-pattern generation and dry etch processing total solution Buxbaum,A., Buie,M.J., Stoehr,B., Montgomery,W., Fuller,S.E. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Optical and Electrical Characterization Study of SiCl4 Reactive-Io-Etched GaAs Murtagh, M., Ye, Shu-Ren, Masterson, H. J., Beechinor, J. T., Crean, G. M., Auret, F. D., Deenapanray, P. N. K., Mayer, … MRS - Materials Research Society
6 Conference Proceedings Plasma and flow modeling of photomask etch chambers Hammond, E., Clevenger, J.O., Buie, M.J. SPIE - The International Society of Optical Engineering	12 Conference Proceedings Reactive Ion Beam Etching for Microcavity Surface Emitting Laser Fabrication:Technology and Damage Characterization Matsutani,A., Tadokoro,T., Koyama,F., Iga,K. Trans Tech Publications

1

2

3

4

5

6

7

8

9

10

11

12