Blank Cover Image

Programmed Rate and Optimal-Control Chemical Vapor Deposition of Tungsten

Author(s):
Publication title:
Chemical vapor deposition : proceedings of the Fourteenth International Conference and EUROCVD-11
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
97-25
Pub. Year:
1997
Page(from):
1566
Page(to):
1573
Pages:
8
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771788 [1566771781]
Language:
English
Call no.:
E23400/97-25
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Optimal Control for LPCVD

Cale, T.S., Crouch, P.E., Song, L., Tsakalis, K.S.

Electrochemical Society
7 Conference Proceedings Optimizing Pulse Protocols in Plasma-Enhanced Atomic Layer Deposition

Prasad, V., Gobbert, M.K., Cale, T.S.

Electrochemical Society
2 Conference Proceedings Programmed Rate Chemical Vapor Deposition (PRCVD) Protocols

Yang, D., Jonnalagadda, R., Rogers, B., Hillman, J., Foster, R., Cale, T.

Electrochemical Society
8 Conference Proceedings Introduction to Plasma Enhanced Chemical Vapor Deposition

Cale S. T., Raupp B. G., Rogers R. B., Myers R. F., Zirkle E. T.

kluwer Academic Publishers
3 Conference Proceedings Study of Factor and Interaction Effects During Programmed Rate Chemical Vapor Deposition of Aluminum

Yang, D., Jonnalagadda, R., Rogers, B. R., Hillman, J. T., Foster, R. F., Cale, T. S.

MRS - Materials Research Society
9 Conference Proceedings IMPACTS OF TEMPERATURE AND REACTANT FLOW RATE TRANSIENTS ON LPCVD TUNGSTEN SILICIDE FILM PROPERTIES

Cale, T. S., Park, J. -H., Raupp, G. B., Jain, M. K.

Materials Research Society
4 Conference Proceedings A Multi-Scale Elasto-Hydrodynamic Contact Model of Chemical Mechanical Planarization

Kim, A., Tichy, J.A., Cale, T.S.

Electrochemical Society
10 Conference Proceedings Impact of Rapid Thermal Annealing of Ti-TiN Bilayers on Subsequent Chemical Vapor Deposition of Tungsten

Mouroux, A., Palmans, R., Keinonen, J., Zhang, S.-L., Maex, K., Petersson, C. S.

MRS - Materials Research Society
5 Conference Proceedings Modeling of Ionized Physical Vapor Deposition of Copper

Bloomfield, M.O., Richards, D.F., Cale, T.S.

Electrochemical Society
11 Conference Proceedings Characterization of tungsten silicide(WSix)film grown by chemical vapor deposition(CVD)

Hossain,F.R., Ambadi,S., Winer,R., Kitt,K., Garcia,C., Pearse,J.

SPIE - The International Society for Optical Engineering
6 Conference Proceedings Advanced statistical process control of a chemical vapor tungsten deposition process on an Applied Materials Centura reactor

J.A. Stefani, S. Poarch, S. Saxena, P.K. Mozumder

Society of Photo-optical Instrumentation Engineers
12 Conference Proceedings Processing of Tungsten Single Crystals by Chemical Vapor Deposition

Zee, R., Xiao, Z., Gale, H.S., Chin, B.A., Begg, L.L.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12