Surface Roughness Evaluation of CVD Doped Oxide Films for Advanced Deep Sub-Micron Semiconductor Applications
- Author(s):
Ilg, M. Ploessl, R. Stuber, J. Conti, R. Cote, D. Gambino, J. Tobben, D. Kirchoff, M. - Publication title:
- Chemical vapor deposition : proceedings of the Fourteenth International Conference and EUROCVD-11
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 97-25
- Pub. Year:
- 1997
- Page(from):
- 749
- Page(to):
- 755
- Pages:
- 7
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566771788 [1566771781]
- Language:
- English
- Call no.:
- E23400/97-25
- Type:
- Conference Proceedings
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