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Thin TiN capped Ti-salicide technology for 0.25 μm CMOS/SIMOX

Author(s):
Matsubara, Y.
Ohnishi, H.
Ishigami, T.
Iguchi, M.
Nakamura, H.
Horiuchi, T.
1 more
Publication title:
Proceedings of the Eighth International Symposium on Silicon-on-Insulator Technology and Devices
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
97-23
Pub. Year:
1997
Page(from):
110
Page(to):
118
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771764 [1566771765]
Language:
English
Call no.:
E23400/97-23
Type:
Conference Proceedings

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