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In-Situ Oxygen Plasma Enhancement for Coherent Ti/TiN Barrier Metal Application

Author(s):
Lee, K.-B.
Kwak, N.-J.
Kim, S.-D.
Kim, C.-T.
Fu, J.
Nahm, M.K.
Diaz, R.
Lai, C.S.
Xu, Z.
Han, B.B.
Park, J.-G.
Jang, W.
7 more
Publication title:
Proceedings of the Second International Symposium on Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
97-9
Pub. date:
1997
Page(from):
333
Page(to):
338
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771368 [1566771366]
Language:
English
Call no.:
E23400/97-9
Type:
Conference Proceedings

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