Model Predictive Control of Plasma Enhanced Chemical Vapor Deposition with Process Variable Constraints

Model Predictive Control of Plasma Enhanced Chemical Vapor Deposition with Process Variable Constraints

Author(s):

Publication title:

Proceedings of the Second International Symposium on Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

97-9

Pub. Year:

1997

Page(from):

84

Page(to):

93

Pub. info.:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566771368 [1566771366]

Language:

English

Call no.:

E23400/97-9

Type:

Conference Proceedings

Details

TDL ID:	ZA00013880
Series ID:	PA00000028
Conf. info. (Name):	International Symposium on Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing ; Meeting of the Electrochemical Society
Conf. info. (Number):	2nd ; 191st
Conf. info. (Venue):	Montreal, Quebec, Canada
Conf. info. (Date):	1997.05.04-1997.05.11

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