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A 0.18 μm CMOS Technology for Elevated Source/Drain MOSFETs Using Selective Silicon Epitaxy

Author(s):
Srivastava, A.
Sun, J.
Bellur, K.
Bartholomew, R.
O'Neil, P.
Celik, M.
Osburn, C.M.
Masnari, N.A.
OEztuerk, M.C.
Westhoff, R.
Fowler, B.
6 more
Publication title:
ULSI science and technology, 1997 : proceedings of the Sixth International Symposium on Ultralarge Scale Integration Science and Technology
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
97-3
Pub. date:
1997
Page(from):
571
Page(to):
586
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771306 [1566771307]
Language:
English
Call no.:
E23400/970512
Type:
Conference Proceedings

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