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Improved Shallow Trench Isolation Process for Sub-Quarter-Micron CMOS Technologies

Author(s):
Sallagoity, P.
Gaillard, F.
Rivoire, M.
Paoli, M.
Brouquet, P.
Haond, M.
McClathie, S.
Beekmann, K.
Kiermasz, A.
Dobson, C.
5 more
Publication title:
ULSI science and technology, 1997 : proceedings of the Sixth International Symposium on Ultralarge Scale Integration Science and Technology
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
97-3
Pub. date:
1997
Page(from):
453
Page(to):
466
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771306 [1566771307]
Language:
English
Call no.:
E23400/970512
Type:
Conference Proceedings

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