Blank Cover Image

The Removal Efficiency of Copper Impurity on Various Silicon Surfaces

Author(s):
Publication title:
ULSI science and technology, 1997 : proceedings of the Sixth International Symposium on Ultralarge Scale Integration Science and Technology
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
97-3
Pub. Year:
1997
Page(from):
211
Page(to):
220
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771306 [1566771307]
Language:
English
Call no.:
E23400/970512
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings DEPENDENCE OF COPPER IMPURITY REMOVAL EFFICIENCY ON SUBSTRATES ETCHING RATE FOR VARIOUS SUBSTRATES IN HYDROFLUORIC SOLUTIONS

Choi, Geun-Min, Morita, Hiroshi, Morinaga, Hitoshi, Kim, Jong-Soo, Ohmi, Tadahiro

Electrochemical Society
7 Conference Proceedings Low-Temperature Formation of Gate-Grade Silicon Oxide Films Using High-Density Krypton Plasma

Saito, Y., Sekine, K., Hirayama, M., Ohmi, T.

Electrochemical Society
2 Conference Proceedings The Dependence of Cu Removal Efficiency on the Initial Cu Concentration of Si Surface

Kim, J.-S., Morita, H., Joo, J.-D., Ohmi, T.

Electrochemical Society
8 Conference Proceedings Megasonic Irradiation-Induced Chemical Reaction in the Solution for Silicon Wafer Cleaning

Ohmi, T., Toda, M., Katoh, M., Kawada, K., Morita, H.

MRS - Materials Research Society
3 Conference Proceedings PARTICLE AND METALLIC IMPURITIES REMOVAL BY USING NEW SPIN CLEANER BASED ON UCT CLEANING CONCEPT

Kwada, K., Nakamori, M., Morita, H., Okano, S., Nitta, T., Ohmi, T.

Electrochemical Society
9 Conference Proceedings COMPARISON OF CLEANING EFFICIENCIES OF NOBEL METALS ON Si SURFACES BETWEEN O3-UPW AND SPM

Joo, J.-D., Kim, J.-S., Morita, H., Ohmi, T.

Electrochemical Society
4 Conference Proceedings Native Oxide Growth Behavior on Silicon Surface With Various Resistivity in Ultrapure Water and CuF2 Solution

Sekine, Katsuyuki, Choi, Geun-Min, Saito, Yuji, Ohmi, Tadahiro

MRS - Materials Research Society
10 Conference Proceedings EFFECT OF pH VALUES IN OZONIZED ULTRAPURE WATER ON CLEANING EFFICIENCY

Yokoi, I., Choi, G.-M., Ohmi, T.

Electrochemical Society
5 Conference Proceedings The Effect of Contamination Solutions and Substrate Conditions on Copper Particle Growth Behavior

Choi, Geun-Min, Sekine, Katsuyuki, Morita, Hiroshi, Ohmi, Tadahiro

MRS - Materials Research Society
11 Conference Proceedings DIFFERENT ADSORPTION BEHVIORS OF PLATINUM GROUP METALS ONSILICON SURFACES

Yokoi, I., Kitami, K., Choi, G.-M., Ohmi, T.

Electrochemical Society
6 Conference Proceedings IMPURITIES ON Si SURFACES ELECTROCHEMiCAL DEPOSITION AND REMOVAL OF METALLIC IMPURITIES ON SILICON SURFACES

Morinaga, Hitoshi, Ohmi, Tadahiro

Electrochemical Society
12 Conference Proceedings SUPRESSION OF SURFACE MICRO-ROUGHNESS OF SILICON WAFER BY ADDITION OF ALCOHOL INTO ULTRA PURE WATER FOR RINSING PROCESS

M. Yamamoto, K. Nii, H. Morinaga, A. Teramoto, T. Ohmi

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12