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Chemical Mechanical Planarization (CMP) Process Windows in Shallow Trench Isolation for Advanced CMOS

Author(s):
Chaterjee, A.
Kwok, S.P.
Ali, I.
Joyner, K.
Shinn, G.
Sheng, I.-C.
1 more
Publication title:
Proceedings of the First International Symposium on Chemical Mechanical Planarization
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
96-22
Pub. date:
1996
Page(from):
219
Page(to):
227
Pages:
9
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771726 [1566771722]
Language:
English
Call no.:
E23400/970318
Type:
Conference Proceedings

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