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Comparison of ICI and IBr Plasma Chemistries for Etching of InGaAlP Alloys

Author(s):
Hong, J.
Lee, J.W
Lambers, E.S.
Abernathy, C.R
Pearton, S.J.
Constantine, C.
Hobson, W.S.
2 more
Publication title:
Proceedings of the Symposium on High Speed III-V Electronics for Wireless Applications and the twenty-fifth State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XXV)
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
96-15
Pub. Year:
1996
Page(from):
56
Page(to):
64
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771658 [156677165X]
Language:
English
Call no.:
E23400/963435
Type:
Conference Proceedings

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