Blank Cover Image

Dependence of the Gate Oxide Integrity on the Crystal Originated Defects in Czochralski Silicon Wafers

Author(s):
Publication title:
Proceedings of the Fourth International Symposium on High Purity Silicon
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
96-13
Pub. Year:
1996
Page(from):
151
Page(to):
159
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771566 [1566771560]
Language:
English
Call no.:
E23400/963433
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Fundamentals of Point Defect Aggregation and Dissolution Phenomena of Crystal Originated Defects in Czochralski Silicon

Wijaranakula,W.

Trans Tech Publications
7 Conference Proceedings Crystal originated particles (COPs), bulk defects including the OSF ring, gate oxide integrity (GOI), and DRAM yield

Rozgonyi, G., Tamatsuka, M., Bae, K.-M., Gonzales, F.

Electrochemical Society
2 Conference Proceedings Investigation on Low Density Defects in Czochralski Silicon Crystals: Their Detectability, Formation Kinetics and Influence on Gate Oxide Integrity

Borionetti, G., Godio, P., Porrini, M., Ilic, S.

Electrochemical Society
8 Conference Proceedings The Impact of the Dwell Time Above 900℃ During Crystal Growth on the Gate Oxide Integrity of Silicon Wafers

Dornberger, E., von Ammon, W., Graef, D., Lambert, U., Miller, A., Oelkrug, H., Ehlert, A.

Electrochemical Society
3 Conference Proceedings Numerical Simulation of Point Defect Distributions in a Growing Czochralski Silicon Crystal in Response to an Abrupt Change in the Growth Conditions

Wijaranakula, W., Zhang, Q. S., Takano, K., Yamagishi, H.

MRS - Materials Research Society
9 Conference Proceedings CRITICAL ASPECTS OF WAFER CLEANING AND GATE OXIDE INTEGRITY

Mertens, P.W., Meuris, M., Schmidt, H.F., Verhaverbeke, S., Heyns, M.M., Carr, P., Graeff, D., Schnegg, A., Kubota, M., …

Electrochemical Society
4 Conference Proceedings MODELLING OF CRYSTAL ORIGINATED PARTICLES AND THEIR IMPACT ON GATE OXIDE INTEGRITY

Bearda, T., Mertens, P.W., Woerlee, P.H., Wallinga, H., Sebmolke, R., Heyns, M.

Electrochemical Society
10 Conference Proceedings CRYSTAL ORIGINATED SINGULARITIES ON SILICON WAFERS AFTER SCl CLEANING

Morita, E., Ryuta, J., Tanaka, T., Shimanuki, Y.

Materials Research Society
5 Conference Proceedings MODELLING OF CRYSTAL ORIGINATED PARTICLES AND THEIR IMPACT ON GATE OXIDE INTEGRITY

Bearda, T., Mertens, P.W., Woerlee, P.H., Wallinga, H., Sebmolke, R., Heyns, M.

Electrochemical Society
11 Conference Proceedings IMPACT OF NITROGEN DOPING IN SILICON ONTO GATE OXIDE INTEGRITY

Huber, A., Kapser, M., Grabmeier, J., Lambert, U., von Ammon, W., Pech, R.

Electrochemical Society
6 Conference Proceedings Vacancy Aggregation Mechanism During Czochralski Silicon Crystal Growth

Wijaranakula, W., Takano, K., Yamagishi, H.

Electrochemical Society
12 Conference Proceedings Organic Contamination of Silicon Wafer in Clean Room Air and Its Impact to Gate Oxide Integrity

Imafuku, D., Mizubayashi, W., Miyazaki, S., Hirose, M., Wakayama, Y., Kobayashi, S.

MRS - Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12