Blank Cover Image

Gas Phase Conditioning of Silicon Surface after Reactive Ion Etching

Author(s):
Publication title:
Proceedings of the eleventh International Symposium on Plasma Processing
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
96-12
Pub. date:
1996
Page(from):
555
Page(to):
563
Pages:
9
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771641 [1566771641]
Language:
English
Call no.:
E23400/962354
Type:
Conference Proceedings

Similar Items:

Hwang, D.K., Ruzyllo, J., Kamieniecki, E.

Electrochemical Society

Roman, P., Hwang, D., Torek, K., Ruzyllo, J., Kamieniecki, E.

MRS - Materials Research Society

Hwang, D.K., Ruzyllo, J., Grant, R.

Electrochemical Society

K. Shanmugasundaram, K. Chang, J. Ruzyllo

Electrochemical Society

Hwang, D.K., Ruzyllo, J., Kamieniecki, E.

Electrochemical Society

Roman, P., Lee, D.-O., Wang, J., Wu, C.-T., Subramanian, V., Brubaker, M., Mumbauer, P., Grant, R., Ruzyllo, J.

Electrochemical Society

Torek, K., Miechkowski, A., Ruzyllo, J.

Electrochemical Society

Nguyen, S.V., Perez, D., Craig, R., Straub, M., Ting, A., Hsiao, R., Hwang, C., Haney, D., Neumann, T.

Electrochemical Society

J. Ruzyllo

Electrochemical Society

Seager, C.H., Panitz, J.K.G., Pettit, R.G., Brice, D.K.

Materials Research Society

Torek, K., Ruzyllo, J., Kamieniecki, E.

Electrochemical Society

Bohme, D.K.

Electrochemical Society

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12