ECR, ICP and RIE plasma etching of GaN
- Author(s):
Shul, R.J. McClellan, G.B. Rieger, D.J. Hafich, M.J. Drummond, T.J. Pearton, S.J. Abernathy, C.R. Constantine, C. Barratt, C. Karlicek, R.F., Jr. Tran, A.C. Schurmann, M. - Publication title:
- Proceedings of the First Symposium on III-V Nitride Materials and Processes
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 96-11
- Pub. Year:
- 1996
- Page(from):
- 159
- Page(to):
- 167
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566771634 [1566771633]
- Language:
- English
- Call no.:
- E23400/962353
- Type:
- Conference Proceedings
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