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Chemical vapor deposition of Aluminum and Gallium Nitride thin films from metal organic precursors

Author(s):
Economou, D.J.
Hoffman, D.M.
Rangarajan, S.P.
Athavale, S.D.
Liu, J.-R.
Zheng, Z.
Chu, W.-K.
2 more
Publication title:
Proceedings of the First Symposium on III-V Nitride Materials and Processes
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
96-11
Pub. date:
1996
Page(from):
69
Page(to):
75
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771634 [1566771633]
Language:
English
Call no.:
E23400/962353
Type:
Conference Proceedings

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