Blank Cover Image

Modeling of SiO2 Stress Relaxation and Stress Dependent Oxidation

Author(s):
Publication title:
Proceedings of the Fourth International Symposium on Process Physics and Modeling in Semiconductor Technology
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
96-4
Pub. date:
1996
Page(from):
417
Page(to):
428
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771542 [1566771544]
Language:
English
Call no.:
E23400/961823
Type:
Conference Proceedings

Similar Items:

Navi, M., Dunham, S. T.

Electrochemical Society

Banerice, S., Dunham, S.T.

Electrochemical Society

Navi, M., Dunham, S.T., Kim, B.Y., Kwong, D.L.

Electrochemical Society

Wristers, D., Wang, H.H., Han, L.K., Lin, C., Chen, T.S., Kwong, D.L., Fulford, J.

Electrochemical Society

Dunham, S.T.

Electrochemical Society

Dunham, S.T., Wittel, F.

Electrochemical Society

Agarwal, A.M., Dunham, S.T.

Electrochemical Society

Gencer, A.H., Dunham, S.T.

Electrochemical Society

Clejan, I., Dunham, S.T.

Electrochemical Society

Dunham, S.T.

Electrochemical Society

Clejan, I., Dunham, S.T.

Electrochemical Society

Pantelides, S.T., Ramamoorthy, M.

Electrochemical Society

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12