High Microwave Power ECR Etching of III-V Semiconductors in CH4/H2/Ar

High Microwave Power ECR Etching of III-V Semiconductors in CH4/H2/Ar

Author(s):

Lee, J.W.

Publication title:

Proceedings of the Twenty-fourth State-of-the-Art Program on Compound Semiconductors

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

96-2

Pub. Year:

1996

Page(from):

203

Page(to):

213

Pub. info.:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566771528 [1566771528]

Language:

English

Call no.:

E23400/962066

Type:

Conference Proceedings

Details

TDL ID:	ZA00013836
Series ID:	PA00000028
Conf. info. (Name):	SOTAPOCS ; Meeting of the Electrochemical Society
Conf. info. (Number):	24th ; 189th
Conf. info. (Venue):	Los Angeles, CA, USA
Conf. info. (Date):	1996.05.05-1996.05.10

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