Blank Cover Image

Wear-Out and Stress-Induced Leakage Current of Ultrathin Gate Oxides

Author(s):
Publication title:
The physics and chemistry of SiO[2] and the Si-SiO[2] interface-3, 1996 : proceedings of the Third International Symposium on the Physics and Chemistry of SiO[2] and the Si-SiO[2] Interface
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
96-1
Pub. date:
1996
Page(from):
677
Page(to):
686
Pages:
10
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771511 [156677151X]
Language:
English
Call no.:
E23400/962115
Type:
Conference Proceedings

Similar Items:

Massoud, H. Z., Shiely, J. P., Shanware, A.

MRS - Materials Research Society

Stinson, M.G., Smith, P.L., Osburn, C.M.

Materials Research Society

Massoud, H.Z.

Electrochemical Society

Shanware, A., Massoud, H. Z., Acker, A., Li, V. Z. Q., Mirabedini, M. R., Henson, K., Hauser, J. R., Wortman, J. J.

MRS - Materials Research Society

Srivastava,A., Osburn,C.M.

SPIE-The International Society for Optical Engineering

Kim, I., Han, S.K., Kiether, W., Lee, S.J., Lee, C.H., Luan, H.F., Luo, Z., Rying, E., Wicaksana, Z.Wang D., Zhu, W., …

Electrochemical Society

Han, S.K, Kim, I., Zhong, H, Heuss, G.P., Lee, J.H, Wicairsana, D., Maria, J.P., Misra, V., Osburn, C.M.

Electrochemical Society

Osburn, C.M., Han, S.K., Kim, I., Campbell, S.A., Garfunkel, E., Gustafson, T., Hauser, J., King, T.-J., Liu, Q., …

Electrochemical Society

Lenahan, P.M., Kang, A.Y., Campbell, J.P.

SPIE-The International Society for Optical Engineering

Ceschia, M., Paccagnella, A., Cester, A., Ghidini, G., Wyss, J.

MRS-Materials Research Society

Tanner, C.M., Lu, J., Blom, H.O., Chang, J.P.

Trans Tech Publications

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12