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Photoluminescence and Electron-Spin-Resonance Studies of Defects in Amorphous SiO2 Films

Author(s):
Nishikawa, H.
Fukui, H.
Watanabe, E.
Ito, D.
Seol, K.S.
Ishii, K.
Ohki, Y.
Takiyama, M.
Tachimori, M.
4 more
Publication title:
The physics and chemistry of SiO[2] and the Si-SiO[2] interface-3, 1996 : proceedings of the Third International Symposium on the Physics and Chemistry of SiO[2] and the Si-SiO[2] Interface
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
96-1
Pub. Year:
1996
Page(from):
418
Page(to):
427
Pages:
10
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771511 [156677151X]
Language:
English
Call no.:
E23400/962115
Type:
Conference Proceedings

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