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Critical Processes for Ultrathin Gate Oxide Integrity

Author(s):
Depas, M.
Heyns, M.M.
Nigam, T.
Kenis, K.
Sprey, H.
Wilhelm, R.
Crossley, A.
Sofield, C.J.
Graef, D.
4 more
Publication title:
The physics and chemistry of SiO[2] and the Si-SiO[2] interface-3, 1996 : proceedings of the Third International Symposium on the Physics and Chemistry of SiO[2] and the Si-SiO[2] Interface
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
96-1
Pub. date:
1996
Page(from):
352
Page(to):
366
Pages:
15
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771511 [156677151X]
Language:
English
Call no.:
E23400/962115
Type:
Conference Proceedings

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