COMPARISON OF HC1 GAS-PHASE CLEANING WITH CONVENTIONAL AND DILUTE WET CHEMISTRIES

COMPARISON OF HC1 GAS-PHASE CLEANING WITH CONVENTIONAL AND DILUTE WET CHEMISTRIES

Author(s):

Elsmore, C.

Publication title:

Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

95-20

Pub. Year:

1995

Page(from):

142

Page(to):

149

Pages:

8

Pub. info.:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566771153 [1566771153]

Language:

English

Call no.:

E23400/962140

Type:

Conference Proceedings

Details

TDL ID:	ZA00013825
Series ID:	PA00000028
Conf. info. (Name):	International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ; Fall Electrochemical Society Meeting
Conf. info. (Number):	4th
Conf. info. (Venue):	Chicago, Illinois, USA
Conf. info. (Date):	1995.10.00

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