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OPTIMIZATION OF HF AND OXIDANT WET CLEANINGS BEFORE 7nm GATE OXIDE

Author(s):
Tardif, F.
Lardin, T.
Paillet, C.
Joly, J.P.
Fleury, A.
Patruno, P.
Levy, D.
Barla, K.
3 more
Publication title:
Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
95-20
Pub. date:
1995
Page(from):
49
Page(to):
59
Pages:
11
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771153 [1566771153]
Language:
English
Call no.:
E23400/962140
Type:
Conference Proceedings

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